My current research in metrology development is based around exploring the design and function of the aberration-corrected scanning transmission electron microscope (STEM), to improve the analysis of atomic-resolution annular dark-field (ADF) data and EELS and EDX chemical mapping. Themes include ADF normalisation by detector efficiency, correction of scan-noise and scan-distortion and correction of artefacts in EELS spectra. As part of this research a series of image analysis and processing codes have been written to inspect, improve and quantify atomic-resolution ADF STEM data.
The default colormap in Digital Micrograph is greyscale, but different applications or communities ofter use other colour look-up tables (CLUT) to highlight certain features or present data more artistically. You can see your colour scale choices in DM by right-clicking on an image and selecting “ImageDisplay…” or by pressing ctrl+D, then selecting ‘Display’ > ‘Color’, you will see something like this:
In 2017 I will be attending several meetings talking about high-precision nanometrology and spectroscopy. You can come find me and chat at:
- MSM-XX, Oxford, UK (April 9th-13th),
- EDGE, Okinawa, Japan (May 14th-19th)
- CCEM Summer School, McMaster University, Canada (June 5-9),
- MMC/EMAG, Manchester, UK (Jul. 3rd-6th),
- M&M2017, St. Louis USA (Aug. 6th-10th),
- FWO Scientific Research Network, Hasselt, Belgium (Sept. 25th),
- CMO Workshop, Oaxaca, Mexico (Oct. 15th-20th).
Correction of scanning tunnelling microscope tip-height and stage instabilities for improved resolution and SNR.
- EMCat, Berlin (Jan. 27-29),
- ESTEEM2 Meeting, Düsseldorf (Feb 29 – Mar 2),
- JEOL, Tokyo (Apr. 4-19),
- CCEM School, McMaster University (May 29 – Jun. 3),
- SCANDEM, Trondheim (Jun. 7-10).
- JEOL UK ARM Users Meeting, Glasgow (Jun. 14-15).
- “New Trends in EM”, Schloss Ringberg (Jun. 22-24),
- EMC, Lyon (Aug. 28 – Sep. 2),
- “Future Technologies in EM”, York (Sept. 12-13),
- NPRL Seminar, U.